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The Hydrogen Technologies Research Laboratory

The Hydrogen Technologies Research Laboratory (HTRL) supports efforts for the discovery and development of materials, processes and systems with the potential to significantly increase the efficiency and reduce the cost of producing hydrogen from domestic natural resources.

Supported research include photoelectrochemical and fuel processing systems to enhance our ability to conveniently and inexpensively produce and store large amounts of hydrogen, and research on fuel cells and biomimetic systems to improve the conversion of hydrogen into electrical energy.

HTRL is a central Technion facility, established jointly by the Grand Technion Energy Program (GTEP), the ADELIS Foundation and the Solar Fuels I-CORE. The laboratory is currently situated in a temporary location until construction of the permanent lab is completed.

Technion’s HTRL facility serves GTEP members as well as faculty from other Technion departments, Israeli academia and industry.

Major Equipment:

> Gas-Chromatograph (GC) (Agilent 7890A) GC is an analytical separation technique used to analyze and identify volatile substances in the gas or liquid phase. The GC is equipped with TCD and FID detectors. Development of techniques to evaluate H2 and O2 in complicated system is also possible.

> Controlled Intensity Modulated Photocurrent Spectroscopy (CIMPS), (Zahner Electrik) CIMPS is a photo-electrochemical system for the advanced characterization of photoelectrodes. It measures the response of the photoelectrodes to modulated light intensity by generating an AC current.
More information on CIMPS

> Solar Simulator (Abet, USA) The Solar Simulator is a light source for testing photoelectrodes and photocatalysts under standard illumination conditions.

> Kelvin Probe (NRH020 KP Technologies) The Nitrogen Relative Humidity Chamber is equipped with a non-scanning Kelvin probe, which is a non-contact, non-destructive vibrating capacitor device used to measure the work function of conducting materials or surface potential of semiconductors. This system is equipped with a high intensity monochromator light source (Horiba Jobin Yvon S.A.S) that enables measuring CPD at different wavelengths. More information on the Kelvin probe

> Ultrasonic Spray Deposition (ExactaCoat, Sono-Tek) A fully-enclosed, programmable 3-axis robot integrated ultrasonic spraying system designed for depositing active layer solutions to produce thin film.
More information on the Ultrasonic spray deposition

> Ivium nStat A multi-channel Potentiostat/Galvanostat with an integrated impedance analyzer. The nStat has four potentiostats, each potentiostat is a completely independent instrument.

> Profilometer (DekTak Bruker) A stylus (contact) profilometer that is used to measure height differences (steps) on samples, and serves as a characterization tool for measuring thin film thickness and surface roughness.

For further details, usage fees and appointments, please contact Dr. Shany Hershkovitz (Laboratory Engineer) at (972)-4-8292118/ -77-887-1874; shaniku3@cc.technion.ac.il